Skip to main content

3 Result(s)

within S. Kuppurao Remove this filter

and

  1. No Access

    Article

    Ultra Thin No/N20 Oxynitride Dielectric for Advanced Flash Memory Application: Single Wafer and Batch Technology

    In this paper a systematic investigation of nitrided oxides obtained by Rapid Thermal Oxidation/Nitridation (RTO/RTN) in AMAT Centura System is reported. Two different aspects were considered: first the compar...

    R. Zonca, B. Crivelli, M. L. Polignano, F. Cazzaniga… in MRS Online Proceedings Library (1999)

  2. No Access

    Article

    Characterization of nitrided silicon-silicon dioxide interfaces

    A newly-developed technique for the simultaneos characterization of the oxide-silicon interface properties and of bulk impurities was used for a systematic study of the nitridation process of thin oxides. This...

    M. L. Polignano, M. Alessandri, D. Brazzelli, B. Crivelli… in MRS Online Proceedings Library (1999)

  3. No Access

    Chapter

    Large-Scale Numerical Modeling of Bulk Crystal Growth from the Melt and Solution

    Crystal growth is an art which is evolving into a science, and large-scale numerical simulation represents a modern tool for speeding this evolution onward. The use of realistic theoretical models can augment ...

    J. Derby, S. Kuppurao, Q. **ao, A. Yeckel… in Science and Technology of Crystal Growth (1995)