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  1. No Access

    Article

    Physical-Chemical Evolution of Hf-aluminates upon Thermal Treatments

    This study presents an investigation on physical-chemical stability of (HfO2)x(Al2O3 )1-x alloys upon prolonged post-deposition annealings. Two different Hf-aluminates were deposited by ALCVDTM, containing 34% an...

    B. Crivelli, M. Alessandri, S. Alberici, D. Brazzelli… in MRS Online Proceedings Library (2003)

  2. No Access

    Article

    Characterization of nitrided silicon-silicon dioxide interfaces

    A newly-developed technique for the simultaneos characterization of the oxide-silicon interface properties and of bulk impurities was used for a systematic study of the nitridation process of thin oxides. This...

    M. L. Polignano, M. Alessandri, D. Brazzelli, B. Crivelli… in MRS Online Proceedings Library (1999)