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Article
Investigations on Electrode-Less Wet Etching of GaN Using Continuous Ultraviolet Illumination
Dry etching of GaN-based devices can introduce damage onto exposed layers of the semiconductor. In this paper, electrode-less wet etching of nominally undoped GaN is investigated in terms of light intensity, s...
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Article
Abnormalities of the somatotrophic axis in the obese agouti mouse
Abnormalities of the melanocortin system produce obesity and increased linear growth. While the obesity phenotype is well characterised, the mechanism responsible for increased linear growth is unclear. The so...
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Article
Influence of dual-frequency plasma-enhanced chemical-vapor deposition Si3N4 passivation on the electrical characteristics of AlGaN/GaN heterostructure field-effect transistors
The influence of dielectric stress on the direct current (DC) electrical characteristics of AlGaN/GaN heterostructure field-effect transistors (HFETs) has been investigated. Dual-frequency plasma deposition wa...
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Article
Electrical characteristics of AlGaN/GaN metal-insulator semiconductor heterostructure field-effect transistors on sapphire substrates
The electrical performance of AlGaN/GaN metal-insulator semiconductor, heterostructure field-effect transistors (MISHFETs) were studied and compared to passivated and unpassivated HFETs. Record MISHFET current...
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Article
Effects of high temperature annealing on the device characteristics of Ga0.52In0.48P/GaAs and Al0.52In0.48P/GaAs heterojunction bipolar transistors
GaInP/GaAs and AlInP/GaAs heterojunction bipolar transistor (HBT) structures were grown by low pressure metalorganic vapor phase epitaxy and annealed at various temperatures up to 675°C for 15 min. Subsequent ...
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Article
Open-tube diffusion techniques for InP/LnGaAs heterojunctior bipolar transistors
Open-tube diffusion techniques used between 450 and 600° C are described which involve the supply of diffusant from a vapour source (via a solution) and a solid evaporated metal source. Investigations of Zn in...
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Article
Diffusion of Cd And Zn In InP between 550 and 650°C
A large number of diffusions have been carried out in sealed quartz ampoules in the temperature range 550–650°C using Zn and Cd in InP. Three-fronted profiles were observed at 650°C for both Cd and Zn and the ...
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Article
Growth and characterization of InGaAsP lattice-matched to InP
The development of InGaAsP lattice-matched to InP as a suitable material for a range of electronic devices is reviewed. Currently accepted values of fundamental material parameters such as lattice constant, en...
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Article
The growth of buffered GaAs mesfet structures by LPE
Layers of LPE GaAs have been grown with background carrier levels in the low 1014 cm−3 range by systematic bakeouts of the Ga melts together with between-run loading in a dry N2 environment. High resistivity laye...