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6 Result(s)

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  1. No Access

    Article

    Ceramic thin film thickness determination by nano-indentation

    Abstracts are not published in this journal

    S. MARIE, M. NADAL, M. DUCARROIR, E. FELDER in Journal of Materials Science Letters (1997)

  2. No Access

    Chapter

    Single-source precursors for the chemical vapor deposition of titanium and vanadium carbide and nitride

    A comparative study of a series of 28 single organometallic precursors to the binary ceramic phases TiC, TiN, VC, VN is reported. The design of the molecules, their thermal behavior, and their use in CVD appli...

    L. Valade, R. Choukroun, P. Cassoux… in The Chemistry of Transition Metal Carbides… (1996)

  3. No Access

    Article

    Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H

    M. Touanen, F. Teyssandier, M. Ducarroir in Journal of Materials Science Letters (1989)

  4. No Access

    Article

    Thermodynamic and experimental study of CVD of non-stoichiometric titanium nitride from TiCl4N2-H2 mixtures

    Using the polynomial description of the Gibbs free energy of formation of titanium nitride against its composition, thermodynamic deposition diagrams were determined at 1900 K. The description of the whole ran...

    F. Teyssandier, C. Bernard, M. Ducarroir in Journal of Materials Science (1988)

  5. No Access

    Article

    Calculation of deposition conditions for Si3N4 from a SiL4-NH3 gas phase (L=H, Cl, Br, CH)

    Deposition conditions yielding silicon nitride are calculated for a set of initial gaseous systems, by complex thermodynamic equilibria computations. The influence of temperature, total pressure and reactant g...

    J. F. Lartigue, M. Ducarroir, B. Armas in Journal of Materials Science (1984)

  6. No Access

    Article

    On the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride

    F. Teyssandier, M. Ducarroir, C. Bernard in Journal of Materials Science Letters (1984)