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Article
Ceramic thin film thickness determination by nano-indentation
Abstracts are not published in this journal
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Article
Theoretical approach to chemical vapour deposition in the atomic system Ti-Si-C-CI-H
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Thermodynamic and experimental study of CVD of non-stoichiometric titanium nitride from TiCl4N2-H2 mixtures
Using the polynomial description of the Gibbs free energy of formation of titanium nitride against its composition, thermodynamic deposition diagrams were determined at 1900 K. The description of the whole ran...
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Article
Calculation of deposition conditions for Si3N4 from a SiL4-NH3 gas phase (L=H, Cl, Br, CH)
Deposition conditions yielding silicon nitride are calculated for a set of initial gaseous systems, by complex thermodynamic equilibria computations. The influence of temperature, total pressure and reactant g...
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Article
On the theoretical conditions of chemical deposition of refractory solid solutions: titanium carbonitride