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    Chapter

    Low Temperature Synthesis and Characterization of Silicon Dioxide Films

    Diethylsilane (DES) has been used as a precursor to produce silicon dioxide films by low pressure chemical vapor deposition. These films were synthesized in the temperature range of 350° to 475° C with the gro...

    G. S. Chakravarthy, R. A. Levy, J. M. Grow… in The Physics and Chemistry of SiO2 and the … (1993)