Skip to main content

and
  1. No Access

    Article

    Oriented lateral growth of two-dimensional materials on c-plane sapphire

    Two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDs) represent the ultimate thickness for scaling down channel materials. They provide a tantalizing solution to push the limit of semicon...

    Jui-Han Fu, Jiacheng Min, Che-Kang Chang, Chien-Chih Tseng in Nature Nanotechnology (2023)

  2. Article

    Open Access

    Total ionizing dose (TID) effects of γ ray radiation on switching behaviors of Ag/AlO x /Pt RRAM device

    The total ionizing dose (TID) effects of 60Co γ ray radiation on the resistive random access memory (RRAM) devices with the structure of Ag/AlO x /Pt were studied. The resistance...

    Fang Yuan, Zhigang Zhang, Jer-Chyi Wang, Liyang Pan, Jun Xu in Nanoscale Research Letters (2014)

  3. Article

    Open Access

    Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaO x interface

    Enhanced resistive memory characteristics with 10,000 consecutive direct current switching cycles, long read pulse endurance of >105 cycles, and good data retention of >104 s with a good resistance ratio of >102 ...

    Amit Prakash, Siddheswar Maikap, Hsien-Chin Chiu in Nanoscale Research Letters (2014)

  4. Article

    Open Access

    Retraction Note: Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface

    Amit Prakash, Siddheswar Maikap, Hsien-Chin Chiu in Nanoscale Research Letters (2013)

  5. Article

    Open Access

    Impact of electrically formed interfacial layer and improved memory characteristics of IrOx/high-κx/W structures containing AlOx, GdOx, HfOx, and TaOx switching materials

    Improved switching characteristics were obtained from high-κ oxides AlOx, GdOx, HfOx, and TaOx in IrOx/high-κx/W structures because of a layer that formed at the IrOx/high-κx interface under external positive bia...

    Amit Prakash, Siddheswar Maikap, Writam Banerjee in Nanoscale Research Letters (2013)

  6. Article

    Open Access

    RETRACTED ARTICLE: Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface

    Enhanced resistive memory characteristics with 10,000 consecutive direct current switching cycles, long read pulse endurance of >105 cycles, and good data retention of >104 s with a good resistance ratio of >102 ...

    Amit Prakash, Siddheswar Maikap, Hsien-Chin Chiu in Nanoscale Research Letters (2013)

  7. Article

    Open Access

    Enhanced nanoscale resistive switching memory characteristics and switching mechanism using high-Ge-content Ge0.5Se0.5 solid electrolyte

    We demonstrate enhanced repeatable nanoscale bipolar resistive switching memory characteristics in Al/Cu/Ge0.5Se0.5/W, as compared with Al/Cu/Ge0.2Se0.8/W structures, including stable AC endurance (>105 cycles), ...

    Sheikh Ziaur Rahaman, Siddheswar Maikap, Atanu Das in Nanoscale Research Letters (2012)

  8. Article

    Open Access

    Formation polarity dependent improved resistive switching memory characteristics using nanoscale (1.3 nm) core-shell IrOx nano-dots

    Improved resistive switching memory characteristics by controlling the formation polarity in an IrOx/Al2O3/IrOx-ND/Al2O3/WOx/W structure have been investigated. High density of 1 × 1013/cm2 and small size of 1.3 ...

    Writam Banerjee, Siddheswar Maikap, Chao-Sung Lai in Nanoscale Research Letters (2012)

  9. Article

    Open Access

    Immobilization of enzyme and antibody on ALD-HfO2-EIS structure by NH3 plasma treatment

    Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH3 plasma treatmen...

    I-Shun Wang, Yi-Ting Lin, Chi-Hsien Huang, Tseng-Fu Lu in Nanoscale Research Letters (2012)