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Article
First Stages of Internal Oxidation in Ag-0.29 and 2.89 at. % Mg Single-Crystal Alloys
Internal oxidation of Ag-0.29 and 2.89 at.% Mg alloys was studied by in-situ X-ray measurements at 300°C. The kinetics and lattice-parameter changes as a function of time are discussed in terms of the formatio...
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Article
X-ray investigation of strain-compensated GaAs: C/AlAs: C distributed Bragg reflectors
X-ray diffraction techniques are used to investigate the strain compensation in GaAs: C/AlAs: C distributed Bragg reflectors (DBR) grown by solid-source molecular beam epitaxy. The strain compensation is achie...
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Article
Optimization of carbon incorporation in GaAs during molecular beam epitaxial growth
Carbon-doped GaAs with dopant concentrations up to about 1020 cm−3 has been grown by molecular beam epitaxy. Above a critical carbon concentration, which depends on the deposition parameters, the surface deterior...
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Article
Determination of the Bonding Configurations of Carbon Acceptors in InxGa1−xAs and AlxGa1−xAs
The local environments of CAs acceptors in InxGa1−xAs and AlxGa1−xAs have been determined from the localized vibrational modes (LVMs) of both isolated CAs impurities and H-CAs pairs using infrared (IR) absorption...
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Article
Does the 1.25 eV Luminescence of Coherently Strained InGaAs Insertions in GaAs Originate from Quantum Dots?
We study the growth of InAs/AlxGa1−xAs/GaAs heterostructures as well as their structural and optical properties. Structurally coherent InAs islands with a narrow size distribution are found to be formed only in a...
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Article
Growth and characterization of ultrathin GaP layer in a GaAs matrix by X-ray interference effect
An ultrathin two monolayers thick layer of GaP sandwiched within a GaAs matrix was grown by atomic layer molecular beam epitaxy (ALMBE). The X-ray interference effect (Pendellösung) was used to determine the s...
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Article
X-Ray Diffraction Determination of Critical Thickness of InAs and InP on GaAs Grown by Atomic Layer Molecular Beam Epitaxy
Two series of samples consisting in a strained layer of InAs (InP) of different thickness, InAs N monolayers (ML) with N=1,2,3, and 4, and, InP M ML with M=2,3,4,5,6 and 7, covered by a GaAs cap layer of 200 n...
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Article
Determination of in-depth thermal strain distribution in Molecular Beam Epitaxy GaAs on Si
In-depth stress distribution GaAs layers grown by Molecular Beam Epitaxy (MBE) on Si (001) has been studied by X-ray diffraction, photoluminescence and Raman spectroscopy. In order to determine the stress stat...
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Article
Atomic layer molecular beam epitaxy growth of InAs on GaAs substrates
InAs layers with thickness ranging from 0.1 to 2.5 μm have been grown directly on highly mismatched (7.4%) (001) GaAs substrates by atomic layer molecular beam epitaxy (ALMBE). This growth method, based on the...