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  1. No Access

    Article

    A direct atomic layer deposition method for growth of ultra-thin lubricant tungsten disulfide films

    We describe a direct atomic layer deposition method to grow lubricant tungsten disulfide (WS2) films. The WS2 films were deposited on a Si (100) substrate and a zinc sulfide (ZnS) film coated the Si (100) substra...

    YongFeng Sun, ZhiMin Chai, **nChun Lu, DanNong He in Science China Technological Sciences (2017)

  2. No Access

    Article

    Influence of crystal structure on friction coefficient of ZnO films prepared by atomic layer deposition

    In this work, the influence of crystal structure on the friction coefficient of zinc oxide (ZnO) films was studied. The ZnO films were deposited on a Si (100) substrate using an atomic layer deposition process...

    ZhiMin Chai, YuHong Liu, **nChun Lu, DanNong He in Science China Technological Sciences (2016)

  3. No Access

    Article

    Tribocorrosion Study of Copper During Chemical Mechanical Polishing in Potassium Periodate-Based Slurry

    Copper chemical mechanical polishing (CMP) in barrier layer slurries with periodate as oxidant has not been intensively studied. This work presents an investigation into copper tribocorrosion in potassium per...

    Jie Cheng, Tongqing Wang, Zhimin Chai, **nchun Lu in Tribology Letters (2015)

  4. No Access

    Article

    Nanowear pretreatment of AFM tips for reasonable friction force

    In a nanoscale friction test, wear of an atomic force microscope (AFM) tip is inevitable. The shape of the worn tip influences the friction force measured. In order to eliminate the influence, nanowear pretrea...

    ZhiMin Chai, YuHong Liu, WeiQi Wang, **nChun Lu… in Science China Technological Sciences (2014)

  5. No Access

    Article

    Reducing Friction Force of Si Material by Means of Atomic Layer-Deposited ZnO Films

    With excellent lubricating property, zinc oxide (ZnO) films are promising candidates to act as protective coatings in Si-based microelectromechanical system devices for the purpose of decreasing friction forc...

    Zhimin Chai, Yuhong Liu, **nchun Lu, Dannong He in Tribology Letters (2014)

  6. No Access

    Article

    Nanotribological Behavior of Ultra-thin Al2O3 Films Prepared by Atomic Layer Deposition

    Si-based nano/micro-electromechanical system (NEMS/MEMS) devices with contacting and rubbing structures cannot run reliably due to their poor tribological performance. A thin alumina (Al2O3) film is a promising c...

    Zhimin Chai, Yuhong Liu, **nchun Lu, Dannong He in Tribology Letters (2014)

  7. No Access

    Article

    Tribo-chemical Behavior of Copper in Chemical Mechanical Planarization

    Chemical mechanical planarization/polishing (CMP) of copper has emerged as an important component in semiconductor processing. It involves both chemical and mechanical effects, consisting of several steps such...

    **g Li, Zhimin Chai, Yuhong Liu, **nchun Lu in Tribology Letters (2013)