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    Article

    Aluminum–germanium wafer bonding of (AlGaIn)N thin-film light-emitting diodes

    Eutectic aluminum–germanium wafer bonding was used to fabricate (AlGaIn)N thin-film light-emitting diodes (LEDs). Wafer bonding was carried out on 2″ wafer level at a bond temperature of 470 °C using patterned...

    Christian Goßler, Michael Kunzer, Mario Baum, Maik Wiemer in Microsystem Technologies (2013)

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    Article

    Implementation of a low temperature wafer bonding process for acceleration sensors

    The paper describes a low temperature bond process based on an oxygen plasma pretreatment followed by 200°C and 400°C annealing which was to be integrated in our technological process flow to produce micromech...

    Maik Wiemer, Thomas Otto, Thomas Gessner, Karla Hiller in MRS Online Proceedings Library (2011)