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Article
Aluminum–germanium wafer bonding of (AlGaIn)N thin-film light-emitting diodes
Eutectic aluminum–germanium wafer bonding was used to fabricate (AlGaIn)N thin-film light-emitting diodes (LEDs). Wafer bonding was carried out on 2″ wafer level at a bond temperature of 470 °C using patterned...
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Article
Implementation of a low temperature wafer bonding process for acceleration sensors
The paper describes a low temperature bond process based on an oxygen plasma pretreatment followed by 200°C and 400°C annealing which was to be integrated in our technological process flow to produce micromech...