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  1. No Access

    Article

    Advanced PCB technologies for space and their assessment using up-to-date standards

    The European Space Agency (ESA) in collaboration with its industrial partners has been updating their standards for Printed Circuit Board (PCB) design, qualification and procurement. These standards include de...

    Stan Heltzel, Maarten Cauwe, Joe Bennett, Thomas Rohr in CEAS Space Journal (2023)

  2. No Access

    Article

    The Effect of SiGe Barriers on the Thermal Stability of Highly B-Doped Si Surface Layers

    We have investigated the use of low-temperature (320 oC) molecular-beam epitaxy (MBE) to form highly conductive, p+, ultra-shallow layers in Si. Although the as-grown B-doped Si is electrically active, in a pract...

    Phillip E. Thompson, Joe Bennett, Robert Crosby… in MRS Online Proceedings Library (2011)

  3. No Access

    Article

    Effect of Fluorine on the Diffusion of Boron in Amorphous Silicon

    Fluorine and boron co-implantation within amorphous silicon has been studied in order to meet the process challenges regarding p+ ultra-shallow junction formation. Previous experiments have shown that fluorine ca...

    J. M. Jacques, L. S. Robertson, K. S. Jones, Joe Bennett… in MRS Online Proceedings Library (2011)

  4. No Access

    Article

    Metrology Study of Sub 20Å Oxynitride by Corona-Oxide-Silicon (COS) and Conventional C-V Approaches

    This work aims to develop an in-line corona-oxide-silicon (COS) monitoring strategy for the sub 20 Å oxynitride gate dielectrics. The oxynitride gate dielectrics were composed of In-Situ Steam Generated oxide (IS...

    Pui Yee Hung, George A. Brown, Michelle Zhang… in MRS Online Proceedings Library (2011)

  5. No Access

    Article

    The Use of SiGe Barriers During the Formation of p+ Shallow Junctions by Ion Implantation

    Ultra-shallow p+ junctions are required for next generation electronics. We present a technique for the formation of ultra-shallow p+ junctions that increases the thermal stability of the junctions formed by ion ...

    Phillip E. Thompson, Joe Bennett, Susan Felch in MRS Online Proceedings Library (2003)

  6. No Access

    Article

    Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing

    The redistribution of nitrogen from silicon to the Si-SiO2 interface due to thermal processing is investigated by Secondary Ion Mass Spectroscopy (SIMS) using Metal-Oxide-Semiconductor (MOS) capacitors. SIMS prof...

    Patrick S. Lysaght, Billy Nguyen, Joe Bennett… in MRS Online Proceedings Library (1999)

  7. Article

    Formation and emission of tetraalkylammonium salt molecular ions sputtered from a gelatin matrix

    A gelatin matrix was simultaneously doped with nine equimolar, homologous, tetraalkylammonium salts ranging in mass from 210 to 770 Da. Bombardment of the sample with kiloelectronvolt ions resulted in a nonide...

    Joe Bennett, Greg Gillen in Journal of the American Society for Mass Spectrometry (1993)

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  8. No Access

    Article

    Laser microprobe mass spectrometry: Possibilities and limitations

    Laser microprobe mass spectrometry (LMMS) offers a great potential for inorganic analysis and speciation as well as for organic structural characterization. This remarkable flexibility makes the results critic...

    Luc Van Vaeck, Joe Bennett, Wim Lauwers, Akos Vertes, Renaat Gijbels in Microchimica Acta (1990)