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Article
Investigation of Characteristics of Al2O3/n-In x Ga1−x As (x = 0.53, 0.7, and 1) Metal–Oxide–Semiconductor Structures
The electrical properties of Al2O3/n-InGaAs metal–oxide–semiconductor capacitors (MOSCAPs) with In content of 0.53, 0.7, and 1 (InAs) have been investigated. Results show small capacitance–voltage (C–V) frequency...
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Article
An AlGaAs/InGaAs HEMT Grown on Si Substrate with Ge/GexSi1-x Metamorphic Buffer Layers
An AlGaAs/InGaAs HEMT grown on Si substrate with Ge/GexSi1−x buffer is demonstrated. The Ge/GexSi1−x metamorphic buffer layer used in this structure was only 1.0 μgm thick. The electron mobility in the In0.18Ga0....