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Article
Cu–Cu Hermetic Seal Enhancement Using Self-Assembled Monolayer Passivation
Low-temperature Cu–Cu thermocompression bonding enabled by self-assembled monolayer (SAM) passivation for hermetic sealing application is investigated in this work. Cavities are etched to a volume of 1.4 × 10−3 c...
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Article
Effect of Prebonding Anneal on the Microstructure Evolution and Cu–Cu Diffusion Bonding Quality for Three-Dimensional Integration
Electroplated copper (Cu) films are often annealed during back-end processes to stabilize grain growth in order to improve their electrical properties. The effect of prebonding anneal and hence the effective i...
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Article
Bonding parameters of blanket copper wafer bonding
A reliable copper wafer bonding process condition, which provides strong bonding at low bonding temperature with a short bonding duration and does not affect the device structure, is desirable for future three...
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Article
Copper bonded layers analysis and effects of copper surface conditions on bonding quality for three-dimensional integration
In order to achieve copper wafer bonding with good quality, surface conditions of copper films are important factors. In this work, the effects of surface conditions, such as surface roughness and oxide format...
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Article
The effect of forming gas anneal on the oxygen content in bonded copper layer
Using a combination of copper (Cu) thermocompression bonding and silicon wafer thinning, a face-to-face silicon bi-layer layer stack is fabricated. The oxygen content in the bonded Cu layer is analyzed using s...
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Article
Temperature and duration effects on microstructure evolution during copper wafer bonding
Interfacial morphologies during Cu wafer bonding at bonding temperatures of 300–400°C for 30 min followed by an optional 30-min or 60-min nitrogen anneal were investigated by means of transmission electron mic...