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Article
Open AccessGrowth of Silicene by Molecular Beam Epitaxy on CaF2/Si(111) Substrates Modified by Electron Irradiation
For the first time, the possibility of producing silicene on CaF2/Si(111) substrates modified by electron irradiation is experimentally demonstrated. It is shown that areas of the planar surface of CaSi2 with hex...
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Article
XAFS Spectroscopy Study of Microstructure and Electronic Structure of Heterosystems Containing Si/GeMn Quantum Dots
Using X-ray absorption near edge structure spectroscopy, extended X-ray absorption fine structure spectroscopy, atomic force microscopy, and Rutherford backscattering spectroscopy, the features of the microstr...
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Article
Analysis of the temperature instability of an InAs/GaAs heterostructure during the process of molecular-beam epitaxy
It is established that, during the process of the molecular-beam epitaxy of InAs on a GaAs substrate, additional absorption of thermal radiation occurs as the film thickness increases, and, as a consequence, t...
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Article
Influence of the surface microroughness of a Si(001) substrate on the morphology of CaF2 epitaxial layers under high-temperature growth conditions
The influence of the surface microroughness of Si(001) substrates on the morphology of CaF2 epitaxial layers is investigated in the high-temperature growth mode. The atomic-force microscopy method is used to demo...