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    Low pressure chemical vapor deposition of B-N-C-H films from triethylamine borane complex

    In this study, films consisting of B-N-C-H have been synthesized by low pressure chemical vapor deposition using the liquid precursor triethylamine borane complex (TEAB) both with and without ammonia. When no NH3

    R. A. Levy, E. Mastromatteo, J. M. Grow, V. Paturi… in Journal of Materials Research (1995)