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    Reference Work Entry In depth

    Secondary Ion Mass Spectroscopy (SIMS)

    Sukbae Joo, Dr. Hong Liang in Encyclopedia of Tribology (2013)

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    Article

    Local/global planarization of polysilicon micropatterns by selectivity controlled CMP

    The planarization CMP, which is considered as one of the most important ULSI chip, is introduced to make flat surface in patterned areas for multilevel MEMS devices. However, the conventional CMP is limited in...

    Woonki Shin, Sungmin Park, Hyoungjae Kim… in International Journal of Precision Enginee… (2009)