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  1. No Access

    Article

    Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization

    Ion-beam sputtering (IBS) has been studied as a means for scalable, mask-less nanopatterning of surfaces. Patterning at the nanoscale has been achieved for numerous types of materials including: semiconductors...

    Jean Paul Allain, Osman El-Atwani, Alex Cimaroli… in MRS Online Proceedings Library (2011)

  2. Article

    Open Access

    Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si

    Ion beam sputtering of ultrathin film Au coatings used as a physical catalyst for self-organization of Si nanostructures has been achieved by tuning the incident particle energy. This approach holds promise as...

    Osman El-Atwani, Sami Ortoleva, Alex Cimaroli… in Nanoscale Research Letters (2011)

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