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    On the Lateral Recrystallization of Amorphous Silicon Nanostructures Using Nickel Silicide

    The method of metal-induced lateral recrystallization is an urgent research task for manufacturing integrated circuits of multilevel architecture, sensitive elements of sensors, as well as electronic microsyst...

    S. O. Belostotskaya, E. V. Kuznetsov, E. N. Rybachek, O. V. Gubanova in Semiconductors (2020)