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    Article

    Electrical Properties of Diamond MISFETs with Submicron-Sized Gate on Boron-Doped (111) Surface

    An H-terminated-surface conductive layer of B-doped diamond on a (111) surface was used to fabricate a metal insulator semiconductor field effect transistor (MISFET) using CaF2, SiO2 or Al2O3 gate insulators and ...

    Takeyasu Saito, Kyung-ho Park, Kazuyuki Hirama in MRS Online Proceedings Library (2006)

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    Article

    Microstructure Analysis of Agglomerated Epitaxial Columns of Si/PtSi/Si(111) Double Heterostructure

    Micro structures and interface structures of epitaxially grown PtSi and over-cap** Si films on Si(111) substrates prepared by MBE were studied by RHEED, HREM, SEM and XRD. An epitaxially grown Si layer on th...

    Kyung-Ho Park, Y. Kumagai, F. Hasegawa in MRS Online Proceedings Library (1993)

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    Chemical Beam Epitaxial Growth of GaAs Epilayer on GaAs(100) Substrate Using Unprecracked Arsine and Trimethylgallium

    We present preliminary results aimed at investigating the effects of unprecracked arsine and trimethylgallium on the CBE(chemical beam epitaxy) growth of GaAs epilayers. We find that the growth rate rises line...

    Seong-Ju Park, Jae-Ki Sim, Jeong-Rae Ro, Byueng-Su Yoo in MRS Online Proceedings Library (1991)

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    Cross-Sectional TEM Specimen Preparation of Semiconductor Devices by Focused Ion Beam Etching

    A procedure for preparing cross-sectional TEM specimens by focused ion beam etching (FIB) of specific regions on an integrated circuit chip is outlined. The investigation of the morphology, structure and local...

    Kyung-ho Park in MRS Online Proceedings Library (1990)

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    Cross-Sectional TEM Study of Three-Dimensional MOS Devices

    This paper describes cross-sectional transmission electron microscopy (TEM) observation on finished 3-D MOS devices, fabricated with a laser-recrystallized SOI. The laser-recrystallized SOI contained crystal d...

    Kyung-Ho Park, T. Sasaki, T. Iwai, M. Hasegawa, N. Sasaki in MRS Online Proceedings Library (1987)

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    Article

    Tem Studies of Silicon-Silicon Oxide Interface Roughness

    Interfaces between two kind of substrate, a bulk silicon wafer and a laser-recrystallized Silicon-On-Insulator (SOI), and its thermally grown oxide have been studied. High resolution transmission electron micr...

    Kyung-Ho Park, T. Sasaki, S. Matsuoka, M. Yoshida in MRS Online Proceedings Library (1987)