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    Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride from Novel Organosilanes

    The environmentally benign precursors diethylsilane and di-t-butylsilane were used with NH3 to synthesize silicon nitride films by plasma enhanced chemical vapor deposition. The growth kinetics and film propertie...

    J. M. Grow, R. A. Levy, Y. Yu, K. T. Shih in MRS Online Proceedings Library (1994)