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    Investigation of CF3I as an Environmentally Benign Dielectric Etchant

    In this study, trifluoroiodomethane (CF3I), a non-global-warming gas, has been investigated as a substitute for typical PFC’s currently used in wafer patterning and CVD chamber cleaning processes. Dielectric film...

    R. A. Levy, V. B. Zaitsev, K. Aryusook, C. Ravindranath… in Journal of Materials Research (1998)