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    The reaction characteristics of ultra-thin Ni films on undoped and doped Si (100)

    Reaction characteristics of ultra-thin Ni films (5 nm and 10 nm) on undoped and highly doped (As-doped and B-doped) Si (100) substrates are investigated in this work. The sheet resistance (Rs) measurements con...

    Yu-Long Jiang, Guo-** Ru, Jian-Hai Liu, **n-** Qu… in Journal of Electronic Materials (2004)