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Article
Open AccessExtended Defects in SiC: Selective Etching and Raman Study
Controlling the electrical properties of SiC requires knowledge of the nature and properties of extended defects. We have employed orthodox defect-selective etching and photo-etching methods to reveal typical ...
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Article
Low dislocation density, high power InGaN laser diodes
We used single crystals of GaN, obtained from high-pressure synthesis, as substrates for Metalorganics Vapor Phase Epitaxy growth of violet and UV laser diodes. The use of high-quality bulk GaN leads to the de...
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Article
Homo-Epitaxial Growth on Misoriented GaN Substrates by MOCVD
The N-side of GaN single crystals with off-angle orientations of 0°, 2°, and 4° towards the [1010] direction was used as a substrate for homo-epitaxial MOCVD growth. The highest misorientation resulted in a re...
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Article
Highly Chemical Reactive Ion Etching of Gallium Nitride
A highly chemical reactive ion etching process has been developed for MOVPE-grown GaN on sapphire. The key element for the enhancement of the chemical property during etching is the use of a fluorine containin...
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Article
A Spectrum Image Cathodoluminescence Study of Dislocations in Si-Doped Liquid-Encapsulated Czochralski GaAs Crystals
Dislocations in Si-doped liquid-encapsulated Czochralski GaAs crystals have been studied by spectrum imaging cathodoluminescence. The interaction between the dislocations and the crystal matrix results in comp...
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Article
Homo-epitaxial growth on misoriented GaN substrates by MOCVD
The N-side of GaN single crystals with off-angle orientations of 0°, 2°, and 4° towards the \(\left[ {10\bar 10} \right]\) dire...
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Article
Highly Chemical Reactive Ion Etching of Gallium Nitride
A highly chemical reactive ion etching process has been developed for MOVPE-grown GaN on sapphire. The key element for the enhancement of the chemical property during etching is the use of a fluorine containin...
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Article
Final polishing of Ga-polar GaN substrates using reactive ion etching
Reactive ion etching of {0001} oriented plate-like GaN single crystals has been investigated using SiCl4:Ar:SF6 chemistry. The reactive ion etching process is highly chemical. Large anisotropy of the etching rate...
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Article
A study of the dislocations in Si-doped GaAs comparing diluted Sirtl light etching, electron-beam-induced current, and micro-Raman techniques
Impurity atmospheres around dislocations have been studied in n-type Si-doped liquid encapsulated Czochralski (LEC) GaAs substrates by micro-Raman spectroscopy, diluted Sirtl-like etching with light (DSL) method,...
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Article
Characterization of GaAs solar cells made by ion implantation and rapid thermal annealing using selective photoetching
Shallow n-p GaAs solar cells have been made by implantation of Si into Zn-doped (p-type) GaAs substrates followed by rapid thermal annealing. The structure of the GaAs crystal has been determined by the DSL photo...
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Article
Influence of the Surface Depletion Layer on the Photoetching Rate at Growth Striations in LEC GaAs
Quantitative energy-dependent EBIC measurements have been used to calibrate the photoetching rate in HF-CrO3 aqueous solutions (DSL method: Diluted Sirtl-like etching with the use of Light) as a function of dopan...
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Article
Microdefects in sulphur doped GaAs
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Article
Influence of Structural and Electrical Characteristics of Extended Defects on GaAs Field Effect Transistors
The paper presents a systematic study of grown-in and process-induced defects on LEC GaAs substrates. Defects have been revealed by photoetching the wafers with diluted Sirti-like solutions after various proce...
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Chapter and Conference Paper
Influence of Defects in Substrates on the Structure of Epitaxial GaAs — Layers Grown by MOCVD
A systematic study has been performed on the relation between defect structure in substrates and epitaxial layers of GaAs grown by MOCVD. A number of (001) oriented HB and LEC grown GaAs substrates which conta...