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  1. Article

    Open Access

    Correction: S1PR1 drives a feedforward signalling loop to regulate BATF3 and the transcriptional programme of Hodgkin lymphoma cells

    An amendment to this paper has been published and can be accessed via a link at the top of the paper.

    K Vrzalikova, M Ibrahim, M Vockerodt, T Perry, S Margielewska, L Lupino, E Nagy… in Leukemia (2019)

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  2. Article

    Open Access

    S1PR1 drives a feedforward signalling loop to regulate BATF3 and the transcriptional programme of Hodgkin lymphoma cells

    The Hodgkin/Reed–Sternberg cells of classical Hodgkin lymphoma (HL) are characterised by the aberrant activation of multiple signalling pathways. Here we show that a subset of HL displays altered expression of...

    K Vrzalikova, M Ibrahim, M Vockerodt, T Perry, S Margielewska, L Lupino, E Nagy… in Leukemia (2018)

    Download PDF (5010 KB) View Article

  3. No Access

    Article

    LIGA micro-openings for coherence characterization of X-rays

    Infinitely thin opaque screens serving for diaphragms as defined in the visible-light optics are not feasible for operation with X-ray beams due to their high penetrability. Micro-openings of predicted sidewal...

    V. Nazmov, M. Kluge, A. Last, F. Marschall, J. Mohr, H. Vogt… in Microsystem Technologies (2014)

  4. No Access

    Article

    Rheumatoid nodules mimicking metastatic anal carcinoma in a patient undergoing multimodality treatment

    N. J. Aherne, S Mincham, M. J. McKay… in International Journal of Colorectal Disease (2013)

  5. No Access

    Article

    Reflectivity test of X-ray mirrors for deep X-ray lithography

    The reflectivity of grazing angle X-ray mirrors, used for X-ray deep lithography, is tested by means of a calorimetric method. A deviation in the reflectivity of a used mirror compared with the reflectivity of...

    V. Nazmov, E. Reznikova, A. Last, M. Boerner, J. Mohr in Microsystem Technologies (2008)

  6. No Access

    Article

    Measurement of side walls of high aspect ratio microstructures

    In this paper, the new method of measurements is presented for the technological control of the lithographic fabrication of high aspect ratio microstructures with complex side-wall profiles. The sampling proce...

    M. Simon, E. Reznikova, V. Nazmov, A. Last in Microsystem Technologies (2008)

  7. No Access

    Article

    Evaluation of optical qualities of a LIGA-spectrometer in SU-8

    In the past few years, SU-8 negative resist has been used in addition to PMMA positive resist for MEMS applications using deep X-ray lithography [1]. The advantage of SU-8 compared to PMMA is a higher sensitiv...

    T. Mappes, S. Achenbach, A. Last, J. Mohr, R. Truckenmüller in Microsystem Technologies (2004)

  8. No Access

    Article

    Shape deviations in masks for optical structures produced by electron beam lithography

    E-beam lithography is a well-known technology used in the structuring of resist for mask fabrication. In the LIGA process E-beam lithography is used to fabricate the first X-ray mask. Due to the high precision of...

    A. Last, H. Hein, J. Mohr in Microsystem Technologies (2004)