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Article
Characterization of Deep Levels in 3C-SiC by Optical-Capacitance-Transient Spectroscopy
An optical-capacitance-transient spectroscopy (O-CTS) method was used to characterize the defects in 3C-SiC on Si. The O-CTS measurement enables us to estimate optical threshold energy and optical cross sectio...
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Article
Activation of Implanted Phosphorus Ions into Silicon by Followed Hydrogen Ion Implantations
The activation of phosphorus implanted into n-type silicon (100) substrate by followed hydrogen ion(H+) implantation was studied by means of spreading resistance technique(SR), secondary ion mass spectroscopy(SIM...
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Article
DLTS study of 3C-SiC grown on Si using hexamethyldisilane
n-type 3C-SiC was heteroepitaxially grown on n-type Si(100) substrates using HMDS (hexamethyldisilane) and characterized by DLTS (deep level transient spectroscopy) measurements. In order to investigate relati...
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Article
Dominant Midgap Levels in the Compensation Mechanism in GaAs
Properties of midgap levels in n-type GaAs crystals were studied by using trap density spectroscopy (TDS), capacitance-voltage and near infrared (NIR) absorption measurements. The TDS analysis for various n-ty...
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Article
Effects of Rapid Thermal Processing on MBE GaAs on Si
Variations of electron traps in molecular-beam-epitaxial (MBE) GaAs 1ayers grown on Si substrates by rapid thermal processing (RTP) have been investigated with deep level transient spectroscopy (DLTS). RTP was...
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Article
Variations of Electron Traps in MBE AlxGa1−xAs by Rapid Thermal Processing
Using deep level transient spectroscopy we have studied the variations of electron traps in molecular beam epitaxial (MBE) AlxGa1−xAs by rapid thermal processing (RTP) using halogen lamps. RTP was performed at 70...
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Article
Diffusion of Te or Zn into GaAs from Doped SiO2 Films by Rapid Thermal Processing
The n+ layers on semi-insulating liquid encapsulated Czochralski GaAs and p+ layers on Si-doped n-type GaAs were formed by rapid thermal diffusion (RTD) from Te- and Zn-doped oxide films, respectively. The Zn dif...
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Article
Diffusion of Zn into Gaas 0.6 P0.4:Te From Zn-Doped Oxide Films By Rapid Thermal Processing
Rapid thermal processing using halogen lamps was applied to the diffusion of Zn into GaAs0.6 P0.4:Te from Zn-doped oxide films. The Zn diffusion coefficient of the rapid thermal diffused (RTD) samples at 800°C fo...