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Article
Modified Abrasives based on fumed SiO2 and Al2O3 for the Cu CMP Process
New abrasive particles based on SiO2 and Al2O3 were produced with different coating and do**. Seven specifically designed particles were dispersed to prepare slurries for Cu CMP. Glycin was used as complexing a...
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Article
News from the M in CMP - Viscosity of CMP Slurries, a Constant?
It is well known and accepted that the viscosity of CMP-slurries has an effect on polishing results. Even though the literature on rheology recognizes that viscosity is not always constant and the slurry can s...