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Article
Si1-x Ge x /Si Interface Profiles Measured to Sub-Nanometer Precision Using uleSIMS Energy Sequencing
The utility of energy sequencing for extracting an accurate matrix level interface profile using ultra-low energy SIMS (uleSIMS) is reported. Normally incident O2 + over an energy range of...
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Article
Cyclotron Resonance of Extremely Conductive 2D Holes in High Ge Content Strained Heterostructures
Cyclotron resonance has been observed in steady and pulsed magnetic fields from high conductivity holes in Ge quantum wells. The resonance positions, splittings and linewidths are compared to calculations of t...
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Article
Diffusion of ion-implanted Boron and Silicon in Germanium
The diffusion of B and Si in Ge is studied using implantation do**. Concentration profiles after furnace annealing in the temperature range 800-900 °C were obtained using high resolution secondary ion mass s...
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Article
Diffusion of Boron in Germanium and Si1-xGex (x>50%) alloys Suresh Uppal
Boron diffusion in germanium and relaxed Si1-xGex alloys with Ge content x>50% is reported. Relaxed SiGe layers were grown by LEPECVD and boron was introduced using ion implantation. Samples were given equal ther...
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Article
Turn-Over and Distribution of Water in Desert Camels, Sheep, Cattle and Kangaroos