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Article
A 14-ps full width at half maximum high-speed photoconductor fabricated with intersecting InP nanowires on an amorphous surface
We demonstrate a high-speed polarization-insensitive photoconductor based on intersecting InP nanowires synthesized between a pair of hydrogenated silicon electrodes deposited on amorphous SiO2 surfaces prepared ...
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Article
Growth and characterization of indium phosphide single-crystal nanoneedles on microcrystalline silicon surfaces
The epitaxial growth of nanometer-scale structures on non-single crystalline surfaces is proposed and demonstrated. Hydrogenated amorphous silicon was deposited onto an SiO2 surface by plasma-enhanced chemical va...
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Article
Formation and characterization of long-chained alkylsiloxane self-assembled monolayers on atomic-layer-deposited aluminum oxide surfaces
We report the formation of highly robust long-chained alkylsiloxane self-assembled monolayers (SAMs) on aluminum oxide films prepared by atomic-layer deposition (ALD). The surface chemistry and the morphologic...
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Article
InGaN/GaN quantum well growth on pyramids of epitaxial lateral overgrown GaN
InGaN/GaN quantum wells (QW) were grown by metalorganic chemical vapor deposition (MOCVD) on pyramids of epitaxial lateral overgrown (ELO) GaN samples. The ELO GaN samples were grown by MOCVD on sapphire (0001...
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Article
Carrier relaxation and recombination in InGaN/GaN quantum heterostructures probed with time-resolved cathodoluminescence
Spatially, spectrally, and temporally resolved cathodoluminescence (CL) techniques have been employed to examine the optical properties and kinetics of carrier relaxation in InGaN/GaN heterostructure and singl...
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Article
Initial Stages of MOCVD Growth of Gallium Nitride Using a Multi-Step Growth Approach
A multilayer buffer layer approach to GaN growth has been developed in which the thermal desorption and mass transport of low temperature buffer layer are minimized by deposition of successive layers at increa...
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Article
Nucleation and growth behavior for GaN grown on (0001) sapphire via multistep growth approach
Formation and coalescence of GaN truncated three dimensional islands (TTIs) on (0001) sapphire are observed during growth of GaN using a close spaced metalorganic chemical vapor deposition reactor. To encourag...
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Article
The Formation and Evolution of InAs 3D Islands on GaAs(001) and a Comparative C-AFM and NC-AFM Study of InAs 3D Islands
The two-dimensional (2D) to three-dimensional (3D) morphology change in the highly strained growth of InAs on GaAs(001) is examined via in-situ, ultra-high vacuum (UHV) scanning tunneling microscopy (STM) and con...
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Article
InAs Island Quantum Box Formation and Vertical Self-Organization on GaAs (100) Via Molecular Beam Epitaxy
In-situ, ultra high vacuum combined scanning tunneling microscope/atomic force microscope (STM/AFM) studies were undertaken to examine the initiation of 3D InAs islands on GaAs (100) and their density and size di...
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Chapter
Semiconductor Nanostructures: Nature’s Way
The accumulated evidence for the formation of semiconductor nanostructures via purely growth approaches on (i) nonplanar patterned substrates, (ii) planar high index surfaces having built-in corrugation, and (...