Skip to main content

2 Result(s)

within M. E. Heaton Remove this filter

and

  1. No Access

    Article

    SU8 resist plasma etching and its optimisation

    The thick photoresist SU8, by virtue of its good mechanical durability, water impermeability and dielectric properties on polymerisation, is widely used as a resin for making high aspect ratio, functional MEMS...

    G. Hong, A. S. Holmes, M. E. Heaton in Microsystem Technologies (2004)

  2. No Access

    Article

    SU8 resist plasma etching and its optimisation

    The thick photoresist SU8, by virtue of its good mechanical durability, water impermeability and dielectric properties on polymerisation, is widely used as a resin for making high aspect ratio, functional MEMS...

    G. Hong, A.S. Holmes, M.E. Heaton in Microsystem Technologies (2004)