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    Potential of the Ultra-thin Layer Fabricated by Wet-process as a Pore-Seal for Porous Low-k Films

    We succeeded in fabricating ultra-thin (<3 nm-thick) layer on top of the surface of porous low-k. The roughness of the surface of porous low-k remains homogeneous even after covering by the thin layer. Furthermor...

    Shoko Sugiyama Ono, Kazuo Kohmura, Hirofumi Tanaka… in MRS Online Proceedings Library (2010)