Skip to main content

and
  1. No Access

    Article

    Fabrication and Electrical Characterization of the Si/ZnO/ZnO:Al Structure Deposited by RF-Magnetron Sputtering

    The electrical transport properties of the structures of Si(p)/ZnO(i)/ZnO: Al(3%) and Si(p)/PS/ZnO(i)/ZnO: Al(3%) deposited by radio-frequency-magnetron sputtering were investigated and compared by using curre...

    A. Alaya, K. Djessas, L. El Mir, K. Khirouni in Journal of Electronic Materials (2016)

  2. No Access

    Article

    Effect of Seed Layer and Thermal Annealing on Structural and Optical Properties of Silicon Layers Deposited by PECVD

    Hydrogenated silicon (Si:H) layers have been deposited on crystalline silicon substrate by radiofrequency plasma-enhanced chemical vapor deposition technique (rf-PECVD) from SiH4/H2 gas mixture using different de...

    N. K. Maaloul, M. Kraini, K. Khirouni, H. Khemakhem in Journal of Electronic Materials (2019)

  3. No Access

    Article

    Thermal, Electrical and Dielectric Characteristics of SnSbS Thin Films for Solar Cell Applications

    Sn3Sb2S6 thin films were elaborated by a vacuum evaporation process, and then they were annealed at 150°C in air for 1 (h). X-ray diffraction results reveal that only the annealed sulfosalt film exhibits a crysta...

    N. Bennaji, Y. Fadhli, I. Mellouki, R. Lahouli in Journal of Electronic Materials (2020)