Skip to main content

1 Result(s)

within Ik Nyun Kim Remove this filter

and

  1. No Access

    Article

    XPS study on oxide ETCH residue and cleaning

    A layer structure, chemical composition and cleaning process of oxide dry etch residue on silicon substrate were studied. I: was observed that the structure of the etch residue consisted of CFx-polymer/SiOyCz. Th...

    Jae Jeong Kim, Eun Gu Lee, Ik Nyun Kim… in Korean Journal of Chemical Engineering (1992)