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  1. No Access

    Article

    Properties of the oxygen vacancy in ZnO

    As-grown ZnO bulk crystals and crystals annealed in vacuum, oxygen, or zinc vapour were characterized by electrical, optical and magnetic resonance spectroscopy. The experiments show that the residual carrier ...

    D.M. Hofmann, D. Pfisterer, J. Sann, B.K. Meyer, R. Tena-Zaera in Applied Physics A (2007)

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    Article

    Energetically deep defect centers in vapor-phase grown zinc oxide

    Vapor-phase grown ZnO crystals were investigated by means of DLTS measurements. The generation of defect center E4 subsequent to annealing in different ambients was monitored. By conducting electron irradiatio...

    T. Frank, G. Pensl, R. Tena-Zaera, J. Zúñiga-Pérez, C. Martínez-Tomás in Applied Physics A (2007)

  3. No Access

    Chapter

    Hall Scattering Factor for Electrons and Holes in SiC

    The analysis of Hall effect data taken on n-and p-type 4H-/6H-SiC is briefly described and the effect of excited states is demonstrated. The determination of the Hall scattering factor for electrons r ...

    F. Schmid, M. Krieger, M. Laube, G. Pensl, G. Wagner in Silicon Carbide (2004)

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    Chapter

    Contributions to the Density of Interface States in SiC MOS Structures

    Development of metal-oxide-semiconductor (MOS) technology for silicon carbide has attracted great attention because of the unique physical, chemical and, in particular, electronic properties of various crystal...

    V. V. Afanas’ev, F. Ciobanu, G. Pensl, A. Stesmans in Silicon Carbide (2004)

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    Chapter

    Phosphorus-Related Centers in SiC

    Phosphorus (P) is considered to serve alternatively to nitrogen (N) as a shallow donor in SiC. It is the aim of this paper to report the present status of our knowledge on the optical and electrical properties...

    M. Laube, F. Schmid, K. Semmelroth, G. Pensl, R. P. Devaty, W. J. Choyke in Silicon Carbide (2004)

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    Chapter

    Low-Defect 3C-SiC Grown on Undulant-Si (001) Substrates

    Attempts to grow mono-crystalline cubic silicon carbide (3C-SiC) have been made using vapor phase hetero-epitaxial growth with Si [1], TiC [2], and sapphire [3] as substrates, and with bulk growth using the subli...

    H. Nagasawa, K. Yagi, T. Kawahara, N. Hatta, G. Pensl, W. J. Choyke in Silicon Carbide (2004)

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    Chapter

    Vacancy Defects Detected by Positron Annihilation

    Point defects in SiC is important in connection with the technological concerns such as ion implantation, crystal growth and radiation tolerance. Among different types of point defects, vacancy defects have be...

    A. Kawasuso, M. Weidner, F. Redmann, T. Frank, P. Sperr, G. Kögel in Silicon Carbide (2004)

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    Article

    Electrically active centers in Si:Er light-emitting layers grown by sublimation molecular-beam epitaxy

    Electrically active centers in light-emitting Si:Er layers grown by sublimation molecular-beam epitaxy (SMBE) on single-crystal Si substrates have been investigated by admittance spectroscopy with temperature ...

    V. B. Shmagin, B. A. Andreev, A. V. Antonov, Z. F. Krasil’nik in Semiconductors (2002)

  9. No Access

    Article

    Physical Properties of SiC

    W. J. Choyke, G. Pensl in MRS Bulletin (1997)

  10. No Access

    Article

    Analysis of the Sublimation Growth Process of Silicon Carbide Bulk Crystals

    Experimental and numerical analysis have been performed on the sublimation growth process of SiC bulk crystals. Crystallographic, electrical and optical properties of the grown silicon carbide (SiC) crystals h...

    R. Eckstein, D. Hofmann, Y. Makarov, St.G. Müller in MRS Online Proceedings Library (1996)

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    Article

    1.54 μm Photoluminescence and Electroluminescence in Erbium Implanted 6H SiC

    Photoluminescence in the neighborhood of 1.54 μm due to the 4I13/24I15/2 transitions is observed from 2 K up to 520 K in erbium implanted 6H SiC. The integrated 1.54 µm photoluminescence (PL) intensity is almost...

    M. Yoganathan, W. J. Choyke, R. P. Devaty, G. Pensl in MRS Online Proceedings Library (1996)

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    Chapter and Conference Paper

    Hall Effect and Infrared Absorption Measurements on Nitrogen Donors in 6H-SiC

    Nitrogen-doped 6H-SiC samples are investigated by Hall and FTIR measurements. Four series of nitrogen-related absorption lines are observed in the spectral regions from 400 to 700 cm−1 and 1000 to 1250 cm−1. The ...

    W. Suttrop, G. Pensl, W. J. Choyke in Amorphous and Crystalline Silicon Carbide … (1992)

  13. No Access

    Chapter and Conference Paper

    Recrystallization and Electrical Properties of High-Temperature Implanted (N,Al) 6H-SiC Layers

    Ion implantation of aluminum and nitrogen in 6H-SiC is investigated using Rutherford backscattering in the channeling mode (RBS/C) and Hall effect for structural and electrical characterization of the implante...

    W. Suttrop, H. Zhang, M. Schadt, G. Pensl in Amorphous and Crystalline Silicon Carbide … (1992)

  14. No Access

    Article

    Deep level transient spectroscopy on radioactive impurities: Demonstration for Si:111In*

    A defect specific analysis technique is introduced that combines the high concentration sensitivity of deep level transient spectroscopy (DLTS) with the radioactive transmutation of probe atoms; this technique...

    M. Lang, G. Pensl, M. Gebhard, N. Achtziger, M. Uhrmacher in Applied Physics A (1991)

  15. No Access

    Article

    Boron-related deep centers in 6H-SiC

    6H-silicon carbide layers are grown by a liquid phase epitaxy (LPE) process. The layers are doped with boron either by ion implantation or during the LPE process from a B-doped silicon melt. Deep-level transie...

    W. Suttrop, G. Pensl, P. Lanig in Applied Physics A (1990)

  16. No Access

    Article

    Infrared Studies of the Double Acceptor Zinc in Silicon

    In the present paper, optical absorption studies on the neutral charge state of the double acceptor zinc in silicon are presented. Measurements were carried out in the mid infrared (MIR) and in the near infrar...

    A. Dörnen, R. Kienle, K. Thonke, P. Stolz, G. Pensl in MRS Online Proceedings Library (1989)

  17. No Access

    Article

    Photoluminescence study of acceptor-carbon complexes in irradiated silicon: Aluminum-related defects

    The paper reports photoluminescence studies on two defects, All at 0.836 eV and Al2 at 0.886 eV, created by aluminum complexing in irradiated silicon after thermal annealing at around 300 °C. The optical data ...

    E. Irion, N. Bürger, W. Kürner, K. Thonke, R. Sauer, W. Zulehner in Applied Physics A (1989)

  18. No Access

    Article

    New oxygen donors in silicon

    Oxygen donor traps and oxygen-related precipitates are investigated by deep level transient spectroscopy (DLTS) and transmission electron microscopy (TEM). The so-called New Donors (ND's) occur after thermal t...

    G. Pensl, M. Schulz, K. Hölzlein, W. Bergholz, J. L. Hutchison in Applied Physics A (1989)

  19. No Access

    Article

    Complexing of nitrogen with carbon and oxygen in silicon: Photoluminescence studies

    We study interactions of nitrogen with carbon and oxygen in crystalline silicon by photoluminescence spectroscopy. Such processes manifest themselves in five photoluminescence lines in the spectral region arou...

    A. Dörnen, R. Sauer, G. Pensl in Journal of Electronic Materials (1988)

  20. No Access

    Article

    Dlts-Studies on the “New Oxygen Donor” in Heat Treated and Hydrogenated CZ-Grown SI

    Cz-grown Si samples containing a high concentration of oxygen are investigated after various processing steps by DLTS. Heat treatments ranging from 500°C–1000°C are performed to study the formation and annihil...

    Karlheinz Hölzlein, G. Pensl, M. Schulz, N. M. Johnson in MRS Online Proceedings Library (1985)

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