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  1. Article

    Characterization of Thin Titanium and Titanium Nitride Layers Using Sims

    Titanium (Ti) and titanium nitride (TiN) films are widely used as barrier stack to prevent junction spiking. It is also an important material for an anti-reflection coating (ARC) on aluminum (Al) films to faci...

    Andrei V. Li-Fatou, Mauro R. Sardela Jr., Chunsheng Tian in MRS Online Proceedings Library (1998)

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    Characterization of oxygen precipitates in Czochralski silicon by imaging SIMS

    This paper presents a three-dimensional characterization of oxygen defects in Czochralski-silicon (CZ) by 3D-SIMS using a camera based imaging system. Different manufacturing processes yielding a variation in ...

    Stefan Gara, Herbert Hutter, Gerhard Stingeder, Chunsheng Tian… in Microchimica Acta (1992)

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    Boron implantation in Si: Channeling effects studied by SIMS and simulation

    The axial channeling behaviour of boron implants in <100>, <110> and <111> silicon wafers is investigated by SIMS. Large differences of channeling characteristics such as channeled projected range (the project...

    Chunsheng Tian, Stefan Gara, Gerhard Hobler, Gerhard Stingeder in Microchimica Acta (1992)