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    Low cost transparent SU-8 membrane mask for deep X-ray lithography

    Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm)2 and compatibility with the standard fabrication processes (optical ...

    S. Cabrini, F. Pérennès, B. Marmiroli, A. Olivo, A. Carpentiero… in Microsystem Technologies (2005)