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    Article

    Low Temperature Dopant Activation Using Variable Frequency Microwave Annealing

    Variable frequency microwaves (VFM) and rapid thermal annealing (RTA) were used to activate ion implanted dopants and re-grow implant-damaged silicon. Four-point-probe measurements were used to determine the e...

    T. L. Alford, K. Sivaramakrishnan, A. Indluru… in MRS Online Proceedings Library (2021)

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    Article

    Threshold Voltage Shift Variation of a-Si:H TFTs With Anneal Time

    Hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) are widely used in many areas and the most important application is in active matrix liquid crystal display. However, the instability of the...

    A. Indluru, S. M. Venugopal, D. R. Allee, T. L. Alford in MRS Online Proceedings Library (2021)