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    Simulation of Lithography-caused Gate Length and Interconnect Linewidth Variational Impact on Circuit Performance in Nanoscale Semiconductor Manufacturing

    As the critical dimension (CD) is scaled into nanometer dimensions, operating frequencies exceed a gigahertz, and more functional blocks are added into systems on chip (SoC), interconnect has become a bottlene...

    Munkang Choi, Cheng Jia, Linda Milor in Simulation of Semiconductor Processes and … (2004)