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  1. Article

    Open Access

    Trap-mediated electronic transport properties of gate-tunable pentacene/MoS2 p-n heterojunction diodes

    We investigated the trap-mediated electronic transport properties of pentacene/molybdenum disulphide (MoS2) p-n heterojunction devices. We observed that the hybrid p-n heterojunctions were gate-tunable and were s...

    Jae-Keun Kim, Kyungjune Cho, Tae-Young Kim, **su Pak, **gon Jang in Scientific Reports (2016)

  2. Article

    Open Access

    Robust and stretchable indium gallium zinc oxide-based electronic textiles formed by cilia-assisted transfer printing

    Electronic textile (e-textile) allows for high-end wearable electronic devices that provide easy access for carrying, handling and using. However, the related technology does not seem to be mature because the ...

    Jongwon Yoon, Yunkyung Jeong, Heeje Kim, Seonggwang Yoo in Nature Communications (2016)

  3. Article

    Open Access

    Substrate-mediated strain effect on the role of thermal heating and electric field on metal-insulator transition in vanadium dioxide nanobeams

    Single-crystalline vanadium dioxide (VO2) nanostructures have recently attracted great attention because of their single domain metal-insulator transition (MIT) nature that differs from a bulk sample. The VO2 nan...

    Min-Woo Kim, Wan-Gil Jung, Hyun-Cho, Tae-Sung Bae, Sung-** Chang in Scientific Reports (2015)

  4. Article

    Open Access

    Surface energy-mediated construction of anisotropic semiconductor wires with selective crystallographic polarity

    ZnO is a wide band-gap semiconductor with piezoelectric properties suitable for opto-electronics, sensors and as an electrode material. Controlling the shape and crystallography of any semiconducting nanomater...

    Jung Inn Sohn, Woong-Ki Hong, Sunghoon Lee, Sanghyo Lee, JiYeon Ku in Scientific Reports (2014)

  5. No Access

    Article

    Growth and characterization of Si1−x Getx QDs on Si/Si0.8Ge0.2 layer

    Si1−x Getx QDs structures were grown onto Si/Si0.8Ge0.2 layer using RPCVD system. Ge composition in Si1−x Getx QDs was determined as about 30% and...

    Taek Sung Kim, Yeon-Ho Kil, Hyeon Deok Yang, Jong-Han Yang in Electronic Materials Letters (2012)

  6. No Access

    Article

    Nanoscale dry etching of germanium by using inductively coupled CF4 plasma

    The nanoscale dry etching of germanium was investigated by using inductively coupled CF4 plasma and electron-beam lithography. The optimal dose of PMMA as E-beam lithography resist was ∼200 mC/cm2. When ICP Power...

    Kyu-Hwan Shim, Ha Yong Yang, Yeon-Ho Kil, Hyeon Deok Yang in Electronic Materials Letters (2012)