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2 Result(s)
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Article
Residual stress classification of pulsed DC reactive sputtered aluminum nitride film via large-scale data analysis of optical emission spectroscopy
The amount of residual stress generated during the growth process of aluminum nitride (AlN) thin films prepared by pulsed DC reactive magnetron sputtering was investigated. The evaluated process parameters wer...
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Article
A multi-step deposited AlN films in a DC pulsed sputtering and film characteristics classification with principal component analysis of OES data
In this work, a unique approach in experiments was carried out by a pulsed DC sputtering for the 60/30-min process in one-step and multi-step (two- and four-step) deposition to obtain trends of residual stress...
