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6 Result(s)

within U. Kleineberg Remove this filter Characterization and Evaluation of Materials Remove this filter

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  1. No Access

    Article

    Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction

    We present a method of deriving single layer thickness fluctuations of Mo/Si EUV multilayers from cross-sectional high-resolution transmission electron microscopy micrographs. The obtained thickness values for...

    A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y.C. Lim… in Applied Physics A (2003)

  2. No Access

    Article

    Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy

    The local surface oxidation of the permalloy surface layer in Py/Cu GMR multilayers on a micron lateral scale has been analyzed by means of a microspot-X-ray absorption spectromicroscope utilizing synchrotron ...

    U. Kleineberg, G. Haindl, A. Hütten, G. Reiss, E.M. Gullikson… in Applied Physics A (2001)

  3. No Access

    Article

    Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

    Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth ΔE≤3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Γ= ...

    Y.C. Lim, T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl… in Applied Physics A (2001)

  4. No Access

    Article

    Metal / Silicon Multilayers Produced by Low-Temperature MOCVD

    W/Si and Mo/Si multilayers with 20 periods (doublelayer spacing d = 24nm) were deposited on silicon substrates using (remote-) plasma-enhanced MOCVD. The substrate temperature was below 200°C, which is necessa...

    F. Hamelmann, G. Haindl, A. Klipp, E. Majkova… in MRS Online Proceedings Library (1998)

  5. No Access

    Article

    STM writing of artificial nanostructures in ultrathin PMMA and SAM resists and subsequent pattern transfer in a Mo/Si multilayer by reactive ion etching

    J. Hartwich, L. Dreeskornfeld, V. Heisig, S. Rahn, O. Wehmeyer… in Applied Physics A (1998)

  6. No Access

    Article

    Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation

    Mo/Si multilayers are fabricated by electron-beam evaporation in UHV at different temperatures (30° C, 150° C, 200° C) during deposition. After completion their thermal stability is tested by baking them at te...

    H. -J. Stock, U. Kleineberg, B. Heidemann, K. Hilgers, A. Kloidt… in Applied Physics A (1994)