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  1. No Access

    Article

    Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction

    We present a method of deriving single layer thickness fluctuations of Mo/Si EUV multilayers from cross-sectional high-resolution transmission electron microscopy micrographs. The obtained thickness values for...

    A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y.C. Lim… in Applied Physics A (2003)

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    Article

    Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

    Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth ΔE≤3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Γ= ...

    Y.C. Lim, T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl… in Applied Physics A (2001)