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    Reference Work Entry In depth

    Secondary Ion Mass Spectroscopy (SIMS)

    Sukbae Joo, Dr. Hong Liang in Encyclopedia of Tribology (2013)

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    Chapter

    Tribology in Chemical–Mechanical Planarization

    Chemical–mechanical planarization (CMP) is one of the most important process steps in making integrated circuits. Tribology plays significant roles in material removal, polishing, and planarization. This chapt...

    Sukbae Joo, Hong Liang in Tribology for Scientists and Engineers (2013)