Skip to main content

and
  1. No Access

    Chapter

    Damage-Free Atomic-Scale Etching and Surface Enhancements by Electron-Enhanced Reactions: Results and Simulations

    Ion-enhanced dry etch methods inflict “etch process damage” through surface ion bombardment. These inherent limitations in conventional dry etch methods create potential roadblocks to achieving device properti...

    Samir J. Anz, David I. Margolese in Computational Materials, Chemistry, and Bi… (2021)