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    Catalytic mechanism of tribochemical mechanical polishing on (0001) C-face of single crystal 6H-SiC substrate

    Aiming at these problems of low efficiency, high cost, and environmental pollution in the chemical mechanical polishing (CMP) process of single crystal SiC substrates, a dry-type tribochemical mechanical polis...

    Mingpu Xue, Wen **ao, Tianyi Zhang… in The International Journal of Advanced Manu… (2024)