Skip to main content

4 Result(s)

within M. Wakagi Remove this filter

and

  1. No Access

    Article

    Preparation and Optical Properties of Ultrathin Silicon Films

    Ultrathin crystalline silicon (c-Si) and amorphous silicon (a-Si:H) films have been prepared using plasma-enhanced chemical vapor deposition (PECVD) and atomic hydrogen etching methods. The complex dielectric ...

    R. W. Collins, Hien V. Nguyen, Ilsin An, Yiwei Lu… in MRS Online Proceedings Library (2011)

  2. No Access

    Article

    Study on Hydrophobic a-C:H:F Overcoat Layer for a-Si:H Photoreceptor

    To solve an image degradation problem of blurring for a-Si:H photoreceptors during the repetitions of electrophotographic process, effect of a-C:H:F overcoat layer has been investigated. The film is deposited ...

    Fuhinori Ishikawa, K. Tamahashi, M. Chigasaki, S. Onuma… in MRS Online Proceedings Library (2011)

  3. No Access

    Article

    Effect of Gas Phase Hydrogen-Dilution on the Nucleation, Growth, and Interfaces of a-Si1-xCx:H

    The microstructural evolution of a-Si1−xCx:H with an optical gap of 1.95 eV, prepared by plasma-enhanced chemical vapor deposition (PECVD), has been studied versus gas phase H2-dilution by real time spectroscopic...

    Yiwei Lu, Ilsin An, M. Gunes, M. Wakagi, C.R. Wronski… in MRS Online Proceedings Library (1993)

  4. No Access

    Article

    Reduction of Internal Stress of a-Si:H Films by in Situ Measurements of Optical Emission Intensity from SiH4 Plasma

    A parameter which determine internal stress of hydrogenated amorphous silicon (a-Si:H) prepared by plasma CVD method has been investigated to prevent a peeling off or crack forming problem. It is clarified tha...

    K. Tamahashi, M. Wakagi, F. Ishikawa, T. Kaneko… in MRS Online Proceedings Library (1990)