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    On the nature of microwave deposited hard silicon-carbon films

    Hydrogenated silicon-carbon films have been deposited from argon tetramethylsilane mixtures at 873 or 673 K, with or without hydrogen dilution and at 673 K with silane addition, by using microwave assisted CVD...

    S. Scordo, M. Ducarroir, E. Bêche, R. Berjoan in Journal of Materials Research (1998)