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    Removal of nanoparticles on silicon wafer using a self-channeled plasma filament

    The effective removal of nanoparticles from a silicon wafer surface was demonstrated using the self-channeled plasma filament excited by a femtosecond (130 fs) Ti:sapphire laser (λ p=790 nm). The ...

    Jung-Kyu Park, Ji-Wook Yoon, Kyung-Hyun Whang, Sung-Hak Cho in Applied Physics A (2012)