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    Optoelectronic Properties of Plasma CVD a-Si:H Modified by Filament-Generated Atomic H

    We have studied a-Si:H prepared by alternating plasma deposition with atomic H treatments performed with a heated W filament. Real time spectroscopie ellipsometry provides the evolution of film thickness, opti...

    Y. M. Li, I. An, M. Gunes, R. M. Dawson, R. W. Collins… in MRS Online Proceedings Library (1992)