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  1. No Access

    Article

    Hydrogen Plasma-Assisted Atomic Layer Deposition of Ru with Low Oxygen Content

    Ru is extensively used in electrical and energy applications because of its high electrical conductivity and catalytic activity. This study reports the H2 plasma-enhanced atomic layer deposition (PEALD) of Ru thi...

    Geonwoo Park, Keunhoi Kim, Jeong Woo Shin… in Korean Journal of Chemical Engineering (2024)

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    Article

    Nanometer Yttria-doped Ceria Shell by Atomic Layer Deposition over Porous Pt for Improved Oxygen Reduction Reactions

    Designing highly active and thermally stable electrodes is crucial for realizing low-temperature solid oxide fuel cells (LT-SOFCs) with excellent performance. In this study, we fabricated an yttria-doped ceria...

    Jeong Woo Shin, Sungje Lee, Dohyun Go… in International Journal of Precision Enginee… (2023)

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    Article

    Atomic Layer Deposition for Thin Film Solid-State Battery and Capacitor

    The demand for electrical power management has increased in recent years, owing partly to increasing contribution of intermittent renewable energy resources to the overall electricity generation. Electrical en...

    Dohyun Go, Jeong Woo Shin, Seunghyeon Lee… in International Journal of Precision Enginee… (2023)