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Article
Formation and microstructure of cubic metastable iron silicides synthesized during pulsed laser annealing
The phase formation and crystallization processes of metastable [CsCl]Fe1−x Si phases were investigated by irradiatingɛ-FeSi/Si(111) thin films with a pulsed excimer laser in the energy density ra...
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Article
Study of Phase Formations in ε-FeSi Layers by Pulsed Laser Annealing
Pulsed laser annealing has been applied on ε-FeSi layers in order to study the formation of (meta)stable iron silicides. Laser shots of different energy density were applied and/or the number of laser shots wa...
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Article
Laser Induced Epitaxial CoSi2 Formation
While it is possible to grow epitaxial CoSi2 films of a high quality using UHV technology it is much more difficult to produce films of similar quality under high vacuum and non-“clean room” conditions. Tung et a...
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Chapter
Diffusion in Cobalt Silicide During Silicide Formation
The dominant moving species and the mobility of silicon during Co2Si and CoSi formation has been examined using a combination of radioactive 31Si tracers and metal markers. It was found that cobalt was essentiall...
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Article
The Reaction between Thin Ni and Co Films and Their Disilicides
Rutherford backscattering has been used to study metal/disilicide thin film interactions for Ni and Co. Upon heating, the metal first reacted with the disilicide to form Ni2Si and Co2Si, respectively. After compl...